Iridium Sputtering Target

Iridium (Ir) is one of the densest naturally occurring metals and a member of the platinum group, valued for its exceptional corrosion resistance, high melting point, and chemical inertness even at elevated temperatures. These properties make iridium sputtering targets suitable for applications requiring long-term stability under harsh conditions.

Sputtered iridium films are widely used as hard mask and electrode layers in advanced semiconductor manufacturing, as well as in biomedical neural stimulation electrodes, where iridium and iridium oxide (IrOx) coatings offer high charge injection capacity and biocompatibility. Iridium targets are also used in oxygen barrier layers, high-temperature crucible coatings, and catalytic thin-film applications.

For inquiry, please give us the following information:

1. Size with tolerance or Drawing
2. Shape
3. Purity
4. Quantity