Ni-Cr-Si (Nickel-Chromium-Silicon) sputtering target icon

Nickel-Chromium-Silicon Sputtering Target

Nickel-chromium-silicon (NiCrSi) adds silicon to the well-known NiCr resistor alloy system. Because chromium has a positive temperature coefficient of resistance (TCR) and silicon has a negative one, combining the two allows the TCR of the sputtered film to be tuned close to zero for a given composition.

Sputtered NiCrSi thin films are used to fabricate precision thin-film resistors for integrated circuits and hybrid microelectronics, where a low, stable temperature coefficient of resistance combined with high sheet resistance is required for accurate, repeatable resistor performance.

Name Nickel-Chromium-Silicon alloy
Composition Ni55Cr40Si5 wt% (or as requested)
Purity 99.9%
Shape Disc, Plate

For inquiry, please give us the following information:

  1. Size with tolerance or Drawing
  2. Shape
  3. Purity
  4. Quantity

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