Cr/SiO/Si Composite Sputtering Target
Cr/SiO/Si is a cermet (ceramic-metal composite) sputtering target combining chromium metal with silicon monoxide and silicon oxide phases. This composite target system has been used since the 1960s to produce high-resistivity thin films with a low, stable temperature coefficient of resistance (TCR).
Sputtered Cr/SiO/Si (Cr-Si-O) thin films are used to fabricate precision thin-film resistors for hybrid microelectronics and integrated circuits. Resistivity and TCR can be tuned by adjusting the chromium content of the composite target and the oxygen partial pressure during reactive sputtering, making this material system a long-established choice for stable, high-resistance thin-film resistor applications.
| Name | Chromium / Silicon Monoxide / Silicon Composite |
| Symbol | Cr/SiO/Si |
| Purity | 99.5% / higher grades available on request |
| Shape | Disc, Plate |