Iron(III) Oxide Sputtering Target
Iron(III) oxide (Fe2O3, hematite phase) is an abundant, non-toxic n-type semiconductor with a bandgap of approximately 2.1 eV, giving it strong visible-light absorption. Sputtered Fe2O3 thin films retain this light-absorbing behaviour along with good chemical stability in aqueous environments.
Sputtered Fe2O3 (hematite) thin films are widely studied as photoanodes for photoelectrochemical water splitting, exploiting their visible-light absorption and stability in aqueous electrolytes. Fe2O3 thin films are also investigated as anode materials for lithium-ion batteries, as magnetic thin films, and as gas-sensing layers.
| Name | Iron(III) Oxide (Hematite) |
| Symbol | Fe2O3 |
| Purity | 99.9% / higher grades available on request |
| Shape | Disc, Plate |