Aluminum Sputtering Target
Aluminum is a lightweight metal recognized for its excellent electrical and thermal conductivity, as well as its corrosion resistance. As a sputtering target, it is widely used in applications such as thin-film electronics, solar cells, and reflective coatings. Its relatively low melting point facilitates efficient deposition at moderate temperatures, enabling compatibility with various substrate materials.
Aluminum sputtering targets are indispensable in the fabrication of integrated circuits (ICs), where they serve as interconnect materials, and in optical devices, where their high reflectivity enhances performance. These properties also make aluminum suitable for emerging technologies such as MEMS and advanced photovoltaic systems.
Name | Aluminum |
Symbol | Al |
Purity | 99.99%, 99.995%, 99.999% |
Shape | Disc, Planar, Rotary, Arc |
Processing | Forging |
Application | Glass Coating, Decoration, Tool Coating, Lab Research, Semiconductors, MEMS, Flat Panel Display, Magnetic Data Storage, Solar Photovoltaic |
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