Aluminum-Copper Sputtering Target

Aluminum-copper (AlCu) alloy sputtering targets are renowned for their excellent electrical conductivity and thermal properties. The addition of copper to aluminum enhances its strength, thermal conductivity, and overall performance, making AlCu targets ideal for use in microelectronics and power devices. Sputtered AlCu films are widely utilized for interconnects and conductive layers in integrated circuits, delivering improved performance in electronic applications. The combination of aluminum and copper enables the production of high-quality thin films that meet the demanding requirements of modern technology.

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1. Size with tolerance or Drawing
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3. Purity
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