Aluminum Oxide Sputtering Target

Aluminum oxide (Al2O3) sputtering targets are highly valued for their exceptional hardness, thermal stability, and chemical resistance, making them indispensable in thin-film deposition processes. Al2O3 films deposited via sputtering exhibit excellent adhesion to a wide range of substrates, providing durable protective coatings and reliable electrical insulation.

These films are capable of withstanding high temperatures and harsh environmental conditions, effectively acting as barriers against moisture and corrosive agents. Their optical transparency makes them suitable for applications in optical devices, including lenses, sensors, and display technologies. Furthermore, the superior dielectric properties of Al2O3 thin films are ideal for use in capacitors and as insulating layers in advanced integrated circuits, where precise electrical performance is critical.

For inquiry, please give us the following information:

1. Size with tolerance or Drawing
2. Shape
3. Purity
4. Quantity