B Boron

Boron Sputtering Target

Boron is a versatile metalloid known for its exceptional hardness, thermal stability, and chemical reactivity. In sputtering applications, boron is used to produce thin films that improve the electrical properties of semiconductors. Its reactivity facilitates the formation of borides, which are prized for their hardness and wear resistance, making boron valuable for hard coatings.

Additionally, boron serves as a key doping agent in silicon devices, enhancing their conductivity and performance. Boron sputtering targets play a critical role in the development of advanced materials for electronics, optics, and cutting-edge technologies.

Name Boron
Symbol B
Purity 99.5%, 99.9%
Shape Disc, Planar
Application Electronics, Lab Research, Semiconductors, Flat Panel Display

For inquiry, please give us the following information:

  1. Size with tolerance or Drawing
  2. Shape
  3. Purity
  4. Quantity

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