BaO Barium Oxide

Barium Oxide Sputtering Target

Barium oxide (BaO) sputtering targets are valued for their ability to produce thin films with outstanding dielectric and optical properties, making them essential in advanced electronic and optoelectronic applications. Sputtered BaO films exhibit excellent dielectric characteristics, making them ideal for use in capacitors, insulating layers, and other electronic components where high reliability is required.

In optoelectronic applications, BaO films are of interest due to their photoelectric properties, which enable functionalities in sensors and light detection systems. Additionally, BaO’s role as a catalyst in chemical processes expands its potential applications. With a high melting point and excellent thermal stability, BaO sputtering targets are particularly suited for thin-film deposition in high-temperature and demanding environments.

 

Name Barium Oxide sputtering target
Symbol BaO
Purity 99.9%
Melting Point 1,923℃
Density 5.72 g/cm3
Shape Disc, Planar

For inquiry, please give us the following information:

  1. Size with tolerance or Drawing
  2. Shape
  3. Purity
  4. Quantity

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