Bismuth Ferrite Sputtering Target
Bismuth ferrite (BiFeO3) sputtering targets are highly valued for their unique multiferroic properties, combining ferroelectric and magnetic behavior. Sputtered BiFeO3 films are widely applied in advanced technologies such as memory devices, sensors, and spintronic systems, where the coupling of electric and magnetic states enables innovative functionalities.
These films exhibit a high polarization response, making them ideal for non-volatile memory applications requiring stable and energy-efficient operation. Additionally, BiFeO3 films can be deposited at relatively low temperatures, allowing seamless integration with other electronic components in device fabrication. Their operational versatility under diverse environmental conditions further broadens their use in cutting-edge electronic and spintronic devices.
| Name | Bismuth Ferrite |
| Symbol | BiFeO3 |
| Purity | 99.9% |
| Shape | Disc, Planar |