Bismuth Ferrite Sputtering Target

Bismuth ferrite (Bi1.1FeO3) sputtering targets are highly valued for their unique multiferroic properties, combining both ferroelectric and magnetic characteristics. Sputtered Bi1.1FeO3 films are integral to advanced technologies, particularly in memory devices, sensors, and spintronic systems, where the coupling of electric and magnetic states enables innovative functionalities.

These films exhibit a high polarization response, making them ideal for non-volatile memory applications that demand stable performance and energy efficiency. Additionally, Bi1.1FeO3 offers good thermal stability and can be processed at relatively low temperatures, facilitating seamless integration with other electronic components during device fabrication. Its versatility and compatibility with modern manufacturing processes position it as a key material in the development of next-generation electronic devices.

For inquiry, please give us the following information:

1. Size with tolerance or Drawing
2. Shape
3. Purity
4. Quantity