Carbon Graphite Sputtering Target
Carbon is a versatile element, and its sputtering targets are essential for producing thin films with outstanding mechanical properties. Carbon coatings offer enhanced wear resistance, making them ideal for applications such as hard disk drives, protective coatings, and cutting tools.
In addition, carbon films play a critical role in the production of nanostructures and are integral to the fabrication of semiconductor devices. The ability of carbon to form various allotropes, such as diamond, graphite, and amorphous carbon, further broadens its application in sputtering processes, enabling the creation of films with tailored properties for a wide range of advanced technologies.
| Name | Carbon graphite |
| Symbol | C |
| Melting point | 3,650℃ |
| Density | 2.25g/cm3 |
| Purity | 99.99%~99.999% |
| Shape | Disc, Planar |
