Cobalt-Iron-Boron Sputtering Target
Cobalt-iron-boron (CoFeB) alloy sputtering targets are valued for their outstanding magnetic properties, particularly in the fabrication of magnetic thin films and spintronic devices. This alloy offers excellent magnetic softness and high permeability, making it integral to efficient data storage and transfer technologies. Sputtered CoFeB films are commonly utilized in the production of magnetic tunnel junctions (MTJs), a key component in magnetic random-access memory (MRAM) and other spintronic applications. The synergy of cobalt, iron, and boron enhances device performance, supporting advancements in next-generation electronics and memory storage solutions.
| Name | Cobalt-Iron-Boron alloy |
| Composition | CoFeB 40/40/20 wt%, 60/20/20 wt% or as requested |
| Purity | 99.95% |
| Shape | Disc, Planar |