Co3O4 (Cobalt Oxide) sputtering target icon

Cobalt Oxide Sputtering Target

Cobalt oxide (Co3O4) is a p-type semiconductor with a spinel crystal structure, valued for its redox activity between Co3+ and Co4+ states. Sputtered Co3O4 thin films retain this electrochemical activity, along with high natural abundance among transition-metal oxides.

Sputtered Co3O4 thin films are studied as electrocatalyst layers for the oxygen evolution reaction (OER) in water splitting and metal-air battery research, and as anode materials for thin-film lithium-ion batteries, where reactive sputtering of a cobalt target in an oxygen atmosphere is used to form the active Co3O4 layer.

Name Cobalt Oxide
Symbol Co3O4
Purity 99.9% / higher grades available on request
Shape Disc, Plate

For inquiry, please give us the following information:

  1. Size with tolerance or Drawing
  2. Shape
  3. Purity
  4. Quantity

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