Copper-Silicon Sputtering Target

Copper-silicon (CuSi) combines silicon’s very high theoretical lithium-storage capacity with the electrical conductivity and mechanical adhesion provided by copper. Sputtered Si-Cu composite films distribute copper through the silicon matrix, which helps buffer the large volume changes silicon undergoes during lithium insertion and extraction.

Sputtered CuSi thin films are used as anode materials for lithium-ion batteries, where the copper content improves electrical conductivity and adhesion to the current collector, resulting in better capacity retention and cycling stability compared to pure silicon film anodes. Compositionally graded Si-Cu films, with copper content varied through the film thickness, have also been studied to further improve cycle life.

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