Iron-Manganese Sputtering Target

Iron-manganese (FeMn) alloy sputtering targets are valued for their tunable magnetic properties and corrosion resistance. As a sputtering target, FeMn is primarily used to deposit magnetic thin films for data storage devices, sensors, and actuators, where controlled magnetic anisotropy is essential.

FeMn thin films also play a key role in magnetic tunnel junctions, giant magnetoresistance (GMR) sensors, and other spintronic devices used in read heads for hard disk drives, supporting continued advances in high-density data storage technologies.

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