Ge Germanium

Germanium Sputtering Target

Germanium is a high-performance semiconductor material known for its excellent electronic and optical properties. As a sputtering target, germanium is widely used to produce thin films for advanced electronic applications, including transistors, photodetectors, and integrated circuits.

Its seamless compatibility with silicon technology makes it a vital material in semiconductor manufacturing, particularly in high-speed and optoelectronic devices. Additionally, germanium sputtering targets are essential in the production of infrared optics, enabling the fabrication of lenses and sensors for imaging and communication technologies.

Name Germanium
Symbol Ge
Purity 99.999%
Shape Disc, Planar
Melting Point 938.2°C

For inquiry, please give us the following information:

  1. Size with tolerance or Drawing
  2. Shape
  3. Purity
  4. Quantity

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