Hafnium Sputtering Target
Hafnium is a transition metal renowned for its high melting point, excellent thermal stability, and resistance to oxidation. As a sputtering target, hafnium is primarily used to create thin films for microelectronics, particularly in high-k dielectric materials for advanced transistors, enabling improved performance in semiconductor devices.
Its outstanding resistance to oxidation also makes it ideal for protective coatings in harsh environments. Additionally, hafnium sputtering targets are crucial in the aerospace industry, where they are used for thermal barrier coatings to protect components from extreme heat.
| Name | Hafnium |
| Symbol | Hf |
| Purity | Hf+Zr≥99.99%，Zr≤0.2%, 0.3%, 0.5% |
| Shape | Disc, Planar |