Indium Tin Oxide Sputtering Target
Indium tin oxide (ITO) sputtering targets are renowned for their excellent electrical conductivity and high optical transparency, making them essential for producing transparent conductive oxides (TCOs). Sputtered ITO films are widely utilized in applications such as touchscreens, liquid crystal displays (LCDs), and solar cells. These films can be deposited on a variety of substrates with excellent adhesion and uniformity, ensuring reliable performance in demanding environments. The combination of low resistivity and high transmittance in the visible spectrum makes ITO films ideal for optoelectronic devices. Furthermore, ITO is a key material in the development of flexible electronics and serves as a transparent electrode in advanced technologies, including organic light-emitting diodes (OLEDs) and next-generation display systems.
| Name | Indium Tin Oxide |
| Symbol | ITO (In2O3/SnO2 90/10wt %) |
| Relative density | ≧99.5% |
| Electrical resistivity | <1.2*10-4Ω▪cm |
| Thermal coefficient of expansion | 5.8*10-6 K-1 |
| Purity | 99.99% |
| Shape | Disc, Planar |