
Indium Zinc Oxide Sputtering Target
Indium zinc oxide (IZO) sputtering targets are widely recognized for their excellent electrical conductivity, high optical transmittance, and cost-effectiveness. Sputtered IZO films are primarily used as transparent conductive films in touchscreens, solar cells, and flat-panel displays. The incorporation of zinc into indium oxide improves the material’s stability while lowering production costs compared to indium tin oxide (ITO). IZO films exhibit excellent uniformity and adhesion on various substrates, making them suitable for a wide range of applications. Additionally, IZO is actively researched for advanced electronic applications, such as thin-film transistors and sensors, due to its favorable electronic properties and adaptability.
Name | Indium Zinc Oxide |
Symbol | IZO (In2O3/ZnO = 50/50 at%) |
Melting point | 2100℃ |
Density | 6.82g/cm3 |
Purity | 99.99% |
Shape | Disc, Planar |