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Lanthanum Nickel Oxide Sputtering Target
Lanthanum nickel oxide (LaNiO₃) sputtering targets are recognized for their metallic conductivity and perovskite crystal structure. Sputtered LaNiO₃ films exhibit excellent stability and are primarily used as electrodes in solid oxide fuel cells (SOFCs) and as conductive layers in electronic devices. The material’s unique electronic properties make it suitable for applications in sensors and catalytic processes. Furthermore, LaNiO₃ films are integral to the fabrication of complex oxide heterostructures, enabling advancements in electronic and optoelectronic devices.
Name | Lanthanum Nickel Oxide |
Symbol | LaNiO3 |
Melting point | 2,200℃ |
Density | 4.12g/cm3 |
Purity | 99.99% |
Shape | Disc, Planar |