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Magnesium Oxide Sputtering Target
Magnesium oxide (MgO) sputtering targets are recognized for their high thermal stability and insulating properties. Sputtered MgO films are widely used as dielectric materials in electronic devices, providing effective insulation and improving device performance. The material demonstrates excellent chemical stability and can be deposited with high purity, making it suitable for various semiconductor applications. Additionally, MgO is being investigated for use as a buffer layer in the growth of other oxide materials and in gas sensing applications. Its stability and versatility make MgO films valuable across multiple technological fields.
Name | Magnesium Oxide |
Symbol | MgO |
Melting point | 2,800 ℃ |
Density | 3.58 g/cm3 |
Purity | 99.99% |
Shape | Disc, Planar |