Manganese Silicide Sputtering Target

Manganese silicide (Mn₅Si₃) sputtering targets are valued for their semiconductor properties and thermal stability. Sputtered Mn₅Si₃ films are primarily used in electronic applications, including thermoelectric devices, where they facilitate the conversion of temperature gradients into electrical energy. The material demonstrates good electrical conductivity and can be deposited as high-quality thin films, contributing to device performance optimization. Furthermore, Mn₅Si₃ is being investigated for potential use in spintronics and magnetic devices, leveraging its distinctive magnetic properties.

For inquiry, please give us the following information:

1. Size with tolerance or Drawing
2. Shape
3. Purity
4. Quantity