
Molybdenum Sputtering Target
Molybdenum is a refractory metal found in 1778 with a high melting point and excellent thermal conductivity, making it an ideal material for sputtering targets. It is widely used in the production of thin films for semiconductor devices, including as a contact material in integrated circuits.
Additionally, molybdenum sputtering targets are crucial for creating durable coatings that improve component longevity in demanding applications such as electronics and high-performance systems.
| Name | Molybdenum |
| Symbol | Mo |
| Melting point | 2,620°C |
| Density | 10.28g/cm3 |
| Purity | 99.95% |
| Shape | Disc, Planar |

