Nickel-Silicon Sputtering Target

Nickel-silicon (NiSi) alloy sputtering targets are widely utilized in the semiconductor industry for their role in forming low-resistivity silicide layers. NiSi films exhibit excellent electrical conductivity and thermal stability, making them ideal for use in interconnects and ohmic contacts within integrated circuits. The alloy reacts with silicon to form nickel silicide, which enhances the performance and reliability of electronic devices. NiSi is also a key material in advanced CMOS technologies, where consistent and efficient electrical connections are critical for high-performance applications.

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