NiO Nickel(II) Oxide

Nickel (II) Oxide Sputtering Target

Nickel oxide (NiO) sputtering targets are recognized for their semiconducting properties and applicability across various fields. Sputtered NiO films are commonly used in gas sensors due to their sensitivity to gases such as carbon monoxide and ethanol. The material offers good thermal stability and functions as a p-type semiconductor, making it suitable for electronic devices and transparent conductive oxides. Additionally, NiO is being studied for potential applications in catalysis and as a buffer layer in photovoltaic cells.

Name Nickel (II) Oxide
Symbol NiO
Melting point 1,980℃
Density 6 .5 g/cm3
Purity 99.9%
Shape Disc, Planar

For inquiry, please give us the following information:

  1. Size with tolerance or Drawing
  2. Shape
  3. Purity
  4. Quantity

Contact us