Silicon Nitride Sputtering Target

Silicon nitride (Si₃N₄) sputtering targets are recognized for their excellent mechanical properties, thermal stability, and chemical resistance. Sputtered Si₃N₄ films are widely used in applications such as protective coatings, electronic devices, and as a dielectric material in integrated circuits. The material has a low dielectric constant and high breakdown voltage, making it suitable for advanced semiconductor technologies. Additionally, Si₃N₄ is employed in the fabrication of MEMS (Micro-Electro-Mechanical Systems) due to its high strength and thermal shock resistance.

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