Silicon Dioxide Sputtering Target

Silicon dioxide (SiO₂) sputtering targets are widely recognized for their excellent dielectric properties and optical transparency. Sputtered SiO₂ films are commonly used as insulating layers in semiconductor devices, providing effective electrical insulation and protection. The material offers good thermal stability and can be deposited as thin films with high uniformity, making it suitable for microelectronics and photonics applications. Additionally, SiO₂ is used in optical coatings, waveguides, and as a passivation layer in solar cells, expanding its applicability across various technological fields.

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