Strontium Oxide Sputtering Target

Strontium oxide (SrO) sputtering targets are characterized by their high melting point of approximately 2,430°C and unique electrical properties, making them suitable for high-temperature processes and the manufacturing of electronic devices. Sputtered SrO thin films are used as dielectric layers in electronic devices and as substrates for growing other oxide films, playing a key role in the production of flat-panel displays and solar cells. The material offers excellent insulating properties, making it ideal for high-temperature applications. Notably, in cathode-ray tubes (CRTs), SrO is legally required as an X-ray shielding material.

SrO is also used in combination with other materials to form complex oxides, enhancing the performance of specific electronic and optical devices. Furthermore, SrO is being investigated for its potential in catalysis and in the fabrication of complex oxide heterostructures, broadening its applicability in advanced electronic and optoelectronic technologies.

These characteristics make SrO sputtering targets essential in various advanced technology sectors, with their range of applications expected to grow further in the future.

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