
Strontium Oxide Sputtering Target
Strontium oxide (SrO) sputtering targets are characterized by their high melting point of approximately 2,430°C and unique electrical properties, making them suitable for high-temperature processes and the manufacturing of electronic devices. Sputtered SrO thin films are used as dielectric layers in electronic devices and as substrates for growing other oxide films, playing a key role in the production of flat-panel displays and solar cells. The material offers excellent insulating properties, making it ideal for high-temperature applications.
SrO is also used in combination with other materials to form complex oxides, such as SrTiO3 and SrRuO3, enhancing the performance of specific electronic and optical devices. Furthermore, SrO is being investigated for its potential in the fabrication of complex oxide heterostructures, broadening its applicability in advanced electronic and optoelectronic technologies.
| Name | Strontium Oxide |
| Symbol | SrO |
| Melting point | 2,430℃ |
| Density | 4.7 g/cm3 |
| Purity | 99.9% |
| Shape | Disc, Planar |

