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Strontium Titanate Sputtering Target
Strontium titanate (SrTiO3) sputtering targets are recognized for their high dielectric constant and paraelectric properties, making them valuable in advanced electronic applications. Sputtered SrTiO3 films are widely used in capacitors, tunable microwave devices, and as substrates for high-temperature superconductors and the epitaxial growth of other perovskite oxides. The material exhibits low dielectric loss, particularly at low temperatures, and can be deposited with high precision, making it suitable for microelectronics and integrated circuits.
SrTiO3 undergoes a structural phase transition at approximately 105 K, which influences its dielectric behavior. At room temperature, it adopts a cubic perovskite structure, contributing to its isotropic electrical properties. Additionally, SrTiO3 is investigated for its role in photonic devices, quantum computing, and complex oxide heterostructures. Its ability to be precisely doped with various elements enhances its adaptability for different technological applications, including resistive random-access memory (ReRAM) devices.
Recent studies have also explored SrTiO3’s potential in energy harvesting, particularly in thermoelectric devices, where its electronic properties can be optimized through doping or thin-film processing.
Name | Strontium Titanate |
Symbol | SrTiO3 |
Melting point | 1,300 ℃ |
Density | 4.3 g/cm3 |
Purity | 99.99% |
Shape | Disc, Planar |