Tantalum Sputtering Target

Tantalum is a refractory metal with the third-highest melting point among pure metals and excellent corrosion resistance. As a sputtering target, tantalum is primarily used to create thin films for capacitors, high-performance electronic devices, and semiconductor applications.

Its exceptional stability and conductivity make it essential for improving the reliability and performance of advanced electronic components. Tantalum thin films are also utilized in specialized applications, including medical and aerospace technologies.

For inquiry, please give us the following information:

1. Size with tolerance or Drawing
2. Shape
3. Purity
4. Quantity