Tantalum Pentoxide Sputtering Target

Tantalum pentoxide (Ta2O5) sputtering targets are recognized for their high dielectric constant and chemical stability. Sputtered Ta2O5 films are widely used in capacitors as high-k dielectrics, improving energy storage efficiency. The material exhibits low leakage current and high breakdown voltage, making it suitable for advanced semiconductor devices and integrated circuits. Additionally, Ta2O5 is utilized in optical coatings and waveguides due to its high refractive index and transparency in the visible and near-infrared spectra.

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