Titanium Aluminum Sputtering Target
Titanium-aluminum (TiAl) alloy sputtering targets are valued for their excellent mechanical properties, high-temperature stability, and low density. These targets are commonly used to deposit thin films in applications requiring high strength-to-weight ratios, such as aerospace and automotive components. TiAl films offer superior oxidation resistance, making them ideal for protective coatings on turbine blades, engine parts, and other components exposed to extreme temperatures and corrosive environments. The alloy’s unique characteristics also support its use in advanced materials and coatings designed to enhance the durability and performance of industrial systems.
Name | Titanium-Aluminium alloy |
Composition | Ti-30Al, Ti-50Al, Ti-67Al, Ti-70Al at%, or as requested |
Manufacturing Process | Hot Isostatic Pressing |
Relative Density | ≧99.0% |
Purity | 99.5%~99.95% |
Shape | Disc, Planar |