Titanium-Aluminum-Silicon Sputtering Target
Titanium-aluminum-silicon (TiAlSi) alloy sputtering targets are known for their excellent hardness, wear resistance, and oxidation resistance. The inclusion of silicon in the TiAl alloy improves its mechanical properties and enhances thermal stability, making TiAlSi films ideal for a range of applications in the semiconductor and aerospace industries. These films are commonly used as hard coatings for cutting tools, molds, and components exposed to wear. TiAlSi is also applied in microelectronics for diffusion barriers and protective layers in integrated circuits, where its excellent adhesion and stability enhance device performance.
Name | Titanium-Aluminum-Silicon alloy |
Composition | Ti-30Al-60Si-10at%, or as requested |
Relative Density | ≧99.85% |
Purity | 99.9% |
Shape | Disc, Planar |