Titanium Diboride Sputtering Target
Titanium diboride (TiB2) sputtering targets are recognized for their exceptional hardness, excellent electrical conductivity, and high melting point. Sputtered TiB2 films are commonly used in wear-resistant coatings, cutting tools, and electrical contact materials for high-performance applications. The material offers good thermal stability, chemical inertness, and resistance to molten metals, making it suitable for use in demanding environments such as metal processing and high-temperature applications.TiB2 exhibits a unique combination of metallic and ceramic properties, with a high elastic modulus and low density. It is investigated for applications in the aerospace and automotive industries, particularly in components requiring durability and resistance to wear and corrosion. Additionally, TiB2 coatings are explored for their potential in neutron-absorbing applications in nuclear reactors and as diffusion barriers in microelectronics.Recent research has also focused on TiB2’s potential in advanced battery technologies and as a component in composite materials for enhanced mechanical and thermal properties.
| Name | Titanium Diboride |
| Symbol | TiB2 |
| Purity | 99.5% |
| Shape | Disc, Planar |