Titanium Nitride Sputtering Target

Titanium nitride (TiN) sputtering targets are highly regarded for their excellent hardness, wear resistance, and electrical conductivity. Sputtered TiN films are commonly used as hard coatings in cutting tools, drill bits, and various mechanical components to improve durability and performance. The material also serves as a conductive diffusion barrier layer in microelectronics, enhancing device reliability and preventing metal ion migration.TiN exhibits a unique combination of ceramic and metallic properties, with a high melting point (2,950°C) and good thermal stability. Its low friction coefficient and chemical inertness contribute to its widespread use in tribological applications. Additionally, TiN is utilized in decorative coatings due to its gold-like appearance and is explored for applications in biomedical devices due to its biocompatibility and corrosion resistance.Recent research has focused on TiN’s potential in plasmonic applications, particularly in the near-infrared and visible spectra. It is also being investigated for use in energy storage devices, such as supercapacitors, and as a component in advanced solar cell technologies.

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