TiN Titanium Nitride

Titanium Dioxide Sputtering Target

Titanium dioxide (TiO2) sputtering targets are highly valued for their high refractive index, excellent photocatalytic properties, and chemical stability. Sputtered TiO2 films are widely used in applications such as solar cells, where they serve as electron transport layers, and in photocatalytic devices for environmental purification. The material can be deposited in various crystalline phases, including anatase and rutile, to optimize performance for specific applications. TiO2 is also utilized in optical coatings for anti-reflective and high-reflective films, as well as in dielectric layers for microelectronics. Additionally, it exhibits good thermal stability and can be tailored for advanced energy applications such as transparent conductive oxide layers in photovoltaics. Proper handling during sputtering is essential due to the material’s brittleness

Name Titanium Dioxide
Symbol TiO2
Color White
Melting point 1,843℃
Density 3.9 g/cm3
Purity 99.99%
Shape Disc, Planar

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