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Zinc Oxide Sputtering Target
Zinc oxide (ZnO) sputtering targets are valued for their wide bandgap, excellent optical transparency, and semiconducting properties. Sputtered ZnO films are widely used in optoelectronic devices such as light-emitting diodes (LEDs), photodetectors, and transparent conductive oxides (TCOs), where high visible light transparency and electrical conductivity are essential. Compared to indium tin oxide (ITO), ZnO-based TCOs offer advantages in cost-effectiveness and material sustainability, as they do not rely on scarce indium resources. Additionally, ZnO films exhibit superior mechanical flexibility, making them suitable for flexible electronics. Furthermore, ZnO is explored for its piezoelectric properties, enabling its use in pressure sensors, acoustic wave devices, and actuators.
Name | Zinc Oxide |
Symbol | ZnO |
Melting point | 1,975°C |
Density | 5.61 g/cm3 |
Purity | 99.99%, 99.999% |
Shape | Disc, Planar |