Cu-Ni-Si (Copper-Nickel-Silicon) sputtering target icon

Copper-Nickel-Silicon Sputtering Target

Copper-nickel-silicon (CuNiSi) is a precipitation-hardening copper alloy system in which fine Ni2Si intermetallic particles form during ageing, giving a combination of high mechanical strength and high electrical conductivity that is unusual among copper alloys.

This composition family is well established as a bulk lead-frame and electronic connector alloy, where its strength-conductivity balance is highly valued. Sputtered CuNiSi thin films are of interest for reproducing this combination of properties as a functional coating, though dedicated published research on CuNiSi as a sputtered thin film is limited compared to the bulk alloy literature.

Name Copper-Nickel-Silicon alloy
Composition Cu97Ni2.5Si0.5 wt% (C70250-type, or as requested)
Purity 99.9%
Shape Disc, Plate

For inquiry, please give us the following information:

  1. Size with tolerance or Drawing
  2. Shape
  3. Purity
  4. Quantity

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