
Copper-Nickel-Silicon Sputtering Target
Copper-nickel-silicon (CuNiSi) is a precipitation-hardening copper alloy system in which fine Ni2Si intermetallic particles form during ageing, giving a combination of high mechanical strength and high electrical conductivity that is unusual among copper alloys.
This composition family is well established as a bulk lead-frame and electronic connector alloy, where its strength-conductivity balance is highly valued. Sputtered CuNiSi thin films are of interest for reproducing this combination of properties as a functional coating, though dedicated published research on CuNiSi as a sputtered thin film is limited compared to the bulk alloy literature.
| Name | Copper-Nickel-Silicon alloy |
| Composition | Cu97Ni2.5Si0.5 wt% (C70250-type, or as requested) |
| Purity | 99.9% |
| Shape | Disc, Plate |

