Nickel-Aluminium Sputtering Target
Nickel-aluminium (NiAl) is a B2-structured intermetallic compound valued for its high melting point, low density, and excellent high-temperature oxidation resistance, resulting from its ability to form a protective alumina (Al2O3) scale. These properties make sputtered NiAl films well suited for high-temperature protective coating research.
Sputtered and PVD-deposited NiAl films are studied and applied as bond coats in thermal barrier coating (TBC) systems for gas turbine engine components, promoting adhesion between the ceramic top coat and the superalloy substrate while protecting against high-temperature oxidation. NiAl thin films have also been investigated as catalytic layers for hydrogen storage and dehydrogenation applications.
| Name | Nickel-Aluminium alloy |
| Composition | Ni50Al50 at% (β-NiAl, or as requested) |
| Purity | 99.9% |
| Shape | Disc, Plate |