Tin(II) Oxide Sputtering Target
Tin(II) oxide (SnO) is a relatively uncommon p-type oxide semiconductor, in contrast to the more familiar n-type SnO2. Sputtered SnO thin films are metastable and can convert toward SnO2 depending on deposition and annealing conditions, requiring careful process control to obtain the desired p-type SnO phase.
Sputtered SnO thin films are studied as the p-type channel layer in transparent thin-film transistors (TFTs), enabling all-oxide complementary circuits when paired with n-type SnO2 or other n-type oxide TFTs from the same tin-oxide material system. SnO films deposited from Sn/SnO2 or Sn/SnO composite targets have been used to achieve controllable p-type conduction for this purpose.
| Name | Tin(II) Oxide |
| Symbol | SnO |
| Purity | 99.9% / higher grades available on request |
| Shape | Disc, Plate |