Explore Diverse Range of Sputtering Targets
Sputtering is a PVD coating technology widely used for thin-film deposition in industries like semiconductors, optics, and energy. We offer a range of high-quality PVD targets for precision coating applications, partnering with reputable manufacturers to source high-purity metals, alloys, ceramics, and compounds. Our products undergo advanced processes, ensuring superior density, purity, and uniform coatings. Contact us to learn more about our offerings.
List of Sputtering Targets
Metal
Alloy
Ceramic
Proven Quality
Cutting-edge technologies and rigorous quality control applied to manufacturing
Customization
Highly customizable to meet your exact specifications
Compliance
We adhere to all relevant regulations
Competitive Pricing
Offering high quality PVD targets at competitive prices
Delivery
Fast and reliable delivery to keep your projects moving on time
List of Sputtering Targets
Metal
Alloy
- AlB (Aluminium-Boron)
- AlCr (Aluminium-Chromium)
- AlCu (Aluminium-Copper)
- AlMg (Aluminium-Magnesium)
- AlNiMo (Aluminium-Nickel-Molybdenum)
- AlNiY (Aluminium-Nickel-Yttrium)
- AlZr (Aluminium-Zirconium)
- BiSbTe (Bismuth-Antimony-Tellurium)
- BiSeTe (Bismuth-Selenium-Tellurium)
- CoFeB (Cobalt-Iron-Boron)
- CrAl (Chromium-Aluminium)
- CrGe (Chromium-Germanium)
- CrSi (Chromium-Silicon)
- CuNi (Copper-Nickel)
- CuZn (Copper-Zinc)
- FeCrAl (Iron-Chromium-Aluminium)
- FeMn (Iron-Manganese)
- FeZr (Iron-Zirconium)
- HfSi (Hafnium-Silicon)
- InSb (Indium-Antimony)
- MnGa (Manganese-Gallium)
- NiCr (Nickel-Chromium)
- NiFe (Nickel-Iron)
- NiSi (Nickel-Silicon)
- SiAl (Silicon-Aluminium)
- SnAg (Tin-Silver)
- Stainless Steel (1.4301, 1.4401, 1.4404, etc. )
- TiAl (Titanium-Aluminium)
- TiAlSi (Titanium-Aluminium-Silicon)
- TiCu (Titanium-Copper)
- WTi (Tungsten-Titanium)
- ZnTe (Zinc-Tellurium)
- ZrY (Zirconium-Yttrium)
Ceramic
- Al2O3 (Aluminium Oxide)
- AlN (Aluminium Nitride)
- AZO (Aluminium Zinc Oxide)
- BaO (Barium Oxide)
- BaSrTiO3 (Barium Strontium Titanate)
- BaTiO3 (Barium Titanate)
- Bi1.1FeO3 (Bismuth Ferrite)
- Bi2.2WO3 (Bismuth Tungstate)
- Bi2Sr2Ca2Cu3O10 (Bismuth Strontium Calcium Copper Oxide)
- BiFeO3 (Bismuth Ferrite)
- CaF2 (Calcium Fluoride)
- CaMnO3 (Calcium Manganese Oxide)
- CaO (Calcium Oxide)
- CaRuO3 (Calcium Ruthenium Oxide)
- CeO2 (Cerium Oxide)
- CoFe2O4 (Cobalt Ferrite)
- CoO (Cobalt Oxide)
- Cu2O (Copper(I) Oxide)
- CuO (Copper(II) Oxide)
- Eu2O3 (Europium Oxide)
- Ga2O3 (Gallium Oxide)
- HfO2/ZrO2 (Hafnium Zirconium Oxide)
- ITO (Indium Tin Oxide)
- IWO (Tungsten doped Indium Oxide)
- IZO (Indium Zinc Oxide)
- LaB6 (Lanthanum Hexaboride)
- LaNiO3 (Lanthanum Nickel Oxide)
- LaSrMnO (Lanthanum Strontium Manganese Oxide)
- Li4Ti5O12 (Lithium Titanate)
- LiF (Lithium Fluoride)
- LiTaO3 (Lithium Tantalate)
- LSCO (Lanthanum Strontium Cobalt Oxide)
- MgF2 (Magnesium Fluoride)
- MgO (Magnesium Oxide)
- Mn5Si3 (Manganese Silicide)
- MnBi2Te4 (Manganese Bismuth Telluride)
- MnO (Manganese(II) Oxide)
- MnO2 (Manganese Dioxide)
- MoO3 (Molybdenum Trioxide)
- MoS2 (Molybdenum Disulfide)
- MoSe2 (Molybdenum Diselenide)
- NbB2 (Niobium Diboride)
- NiFe2O4 (Nickel Ferrite)
- NiO (Nickel(II) Oxide)
- Sb2S3 (Antimony(III) Sulfide)
- Sb2Se3 (Antimony(III) Selenide)
- Si3N4 (Silicon Nitride)
- SiC (Silicon Carbide)
- SiO2 (Silicon Dioxide)
- SnO2 (Tin(IV) Oxide)
- Sr2V2O7 (Strontium Vanadate)
- SrO (Strontium Oxide)
- SrTiO3 (Strontium Titanate)
- Ta2O5 (Tantalum Pentoxide)
- TiB2 (Titanium Diboride)
- TiN (Titanium Nitride)
- TiO2 (Titanium Dioxide)
- V2O5 (Vanadium Pentoxide)
- WO3 (Tungsten Trioxide)
- Y3Fe5O12 (Yttrium Iron Garnet -YIG)
- YBa2Cu3O7-x (Yttrium Barium Copper Oxide – YBCO)
- YbMnO3 (Ytterbium Manganese Oxide)
- YSZ (Yttria-Stabilized Zirconia)
- ZnO (Zinc Oxide)
- ZrN (Zirconium Nitride)